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ieee.org
ASML Developing Next-Gen EUV Lithography
Productivity gains will continue through the next two or three chip generations, but after that we’ll need something bigger and better
Dec 5, 2018
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6 months ago
5.2K views · 113 reactions | At ASML San Diego — the global Center of Excellence for EUV light source development — engineers, scientists, and innovators work together to create the technology that powers the world's most advanced chips. From intercepting tin droplets with lasers to solving challenges that haven’t been defined yet — this is where the EUV light source truly comes to life. | ASML | Facebook
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1 month ago
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At the heart of ASML’s EUV technology lies a surprising material: tin. It’s essential for generating EUV light, but it also presents a unique challenge. When not properly managed, tin can contaminate the optics inside the light source. That’s why our teams at ASML San Diego are innovating across four primary areas of the EUV source – laser, plasma, tin droplet formation, and tin management – with the goal of maximizing performance while ideally reducing energy consumption and costs. 🔍 Want to d
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